Belgium Import data by HS Code 39201023

Live Import Data of Belgium under the HS Code 39201023, our statistical Import data records includes importer-exporter country name, HS code, month, product description, quantity, value of goods imported.

Detailed Import Data of HS Code 39201023

Date

HS Code

Product Description

Origin Country

QTY.

Unit

Value($)

Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Portugal 15723 KILOGRAM 79386
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

United States 970 KILOGRAM 49755
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Poland 46610 KILOGRAM 107172
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Spain 7388 KILOGRAM 40103
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Peru 118 KILOGRAM 4893
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

France 160099 KILOGRAM 534451
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Czechia 2414 KILOGRAM 7946
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Luxembourg 11812 KILOGRAM 42920
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

China 1806 KILOGRAM 6098
Jul-24
39201023

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Netherlands 170901 KILOGRAM 732852

Shipment No. 1

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

15723

Unit

KILOGRAM

Value($)

79386

Shipment No. 2

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

970

Unit

KILOGRAM

Value($)

49755

Shipment No. 3

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

46610

Unit

KILOGRAM

Value($)

107172

Shipment No. 4

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

7388

Unit

KILOGRAM

Value($)

40103

Shipment No. 5

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

118

Unit

KILOGRAM

Value($)

4893

Shipment No. 6

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

160099

Unit

KILOGRAM

Value($)

534451

Shipment No. 7

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

2414

Unit

KILOGRAM

Value($)

7946

Shipment No. 8

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

11812

Unit

KILOGRAM

Value($)

42920

Shipment No. 9

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

1806

Unit

KILOGRAM

Value($)

6098

Shipment No. 10

Date

Jul-24

HS CODE

Product Description

Non-cellular polyethylene film of a thickness of >= 20 micrometres but <= 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Origin Country

QTY

170901

Unit

KILOGRAM

Value($)

732852

Country

Total Value ($)

Netherlands732852
France534451
Germany482997
Poland107172
Finland99634
Slovenia86141
Portugal79386
United States49755
Italy45736
Luxembourg42920
Please select a country or provide either a description or HS Code.
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